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研究開発から、少LOT多品種、量産まで対応する「手動・半自動・全自動」のローコストな露光装置/マスクアライナーをご提案！
株式会社三明では、コンパクトな微細露光のスタンダード機「LAシリーズ片面マスクアライナー」や、 両面プロセスのローコストアシストモデル「BAシリーズ正面マスクアライナー」、両面・多面プロセスの スタンダード量産機である「BSシリーズ両面同時露光マスクアライナー」といった手動型の露光機をはじめ、 少ロット多品種から量産まで対応した半自動の「セミオートマスクアライナー」や全自動の「フルオートマスクアライナー」など、 優れたローコストな露光装置を多数取り揃えております。 ＊詳しくはお問い合わせ、もしくはカタログをご覧ください。
Compact fine exposure standard machine. 4/6/8 inch standard mask aligner.
The high-performance mask aligner LA series is a standard device for compact fine exposure with 4/6/8 inch standard mask aligners. It is an exposure device capable of high-resolution pattern exposure in research fields requiring photolithography, such as semiconductor device fabrication. It is equipped with a specially designed dual-objective two-field CCD microscope, allowing alignment of small samples with a minimum objective lens spacing of 18mm. It features a wipe device for simultaneous two-field monitoring display, and the Z-axis is driven by air pressure with a gap fine adjustment lever. It supports hard contact, soft contact, and proximity exposure. The parallel mechanism employs reliable spherical bearings for compactness and high versatility. For more details, please contact us or refer to the catalog.
Our company's unique multilayer film deposition multi-mirror lamp house-equipped device.
■ Adoption of a multi-mirror lamp house results in a highly uniform illumination distribution. ■ Improved operability with the adoption of various automatic mechanisms, allowing for semi-automatic use. ■ The alignment microscope features a trinocular tube. Alignment via a monitor is also possible (optional).
You can create an optimal system configuration with a semi-custom setup.
In addition to the general-purpose mask aligner ES20 series, we offer a variety of products including a wafer double-sided exposure type and a back-side observation mask aligner. We also accept custom equipment development and manufacturing tailored to customer specifications for photolithography-related devices and MEMS research and development support equipment.
![[Research Material] Global Market for Lithography Equipment](https://image.mono.ipros.com/public/product/image/b79/2000829281/IPROS14807587796084264134.jpeg?w=280&h=280)
World Market for Lithography Equipment: Mask Aligners, Laser Direct Imaging, Projection, Laser Ablation, ...
This research report (Global Lithography Equipment Market) investigates and analyzes the current status and outlook for the global lithography equipment market over the next five years. It includes information on the global lithography equipment market overview, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The segments by type in the lithography equipment market include mask aligners, laser direct imaging, projection, and laser ablation, while the segments by application focus on MEMS devices, advanced packaging, and LED devices. The regional segments are categorized into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa to calculate the market size of lithography equipment. The report also includes the market share of major companies in lithography equipment, product and business overviews, and sales performance.
